Method of calibrating and using a semiconductor processing...

Optics: measuring and testing – Optical pyrometers

Reexamination Certificate

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C438S007000, C438S016000

Reexamination Certificate

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06876442

ABSTRACT:
A method is provided wherein a temperature reading error of a pyrometer is avoided. An upper pyrometer is used to detect infrared radiation from a test layer formed on a test substrate under standard processing conditions. The infrared radiation from the test layer has a period having a length which is indicative of growth rate of the layer. The period is generally inversely proportional to the growth rate. The growth rate is directly related to the temperature.

REFERENCES:
patent: 4969748 (1990-11-01), Crowley et al.
patent: 5258824 (1993-11-01), Carlson et al.
patent: 5809211 (1998-09-01), Anderson et al.
patent: 6130105 (2000-10-01), Redinbo et al.
patent: 6319732 (2001-11-01), Dils et al.
patent: 6530992 (2003-03-01), Yang et al.
patent: 0 859 406 (1998-08-01), None

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