Method of calibrating a temperature measurement system

Thermal measuring and testing – Thermal calibration system

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

374 2, G01K 5100

Patent

active

058488421

ABSTRACT:
A method of calibrating a temperature measurement system including the steps of heating a first substrate having a high emissivity value to a first process temperature; while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produce temperature indications from the first substrate that are substantially the same, the first probe having associated therewith a first effective reflectivity and the second probe having associated therewith a second effective reflectivity, the first and second effective reflectivities being different; heating a second substrate having a low emissivity value to a second process temperature, the low emissivity value being lower than the high emissivity value; with the second substrate at the second process temperature, using both the first probe and the second probe to measure the temperature of the second substrate, the first probe producing a first temperature indication and the second probe producing a second temperature indication different from the first temperature indication; measuring a sensitivity of the temperature indication produced by the first probe to changes in substrate emissivity; and by using the measured sensitivity and the first and second temperature indications, computing a correction factor for the first probe, the correction factor to be applied to subsequent temperature readings of the first probe to produce corrected temperature readings.

REFERENCES:
patent: 3796099 (1974-03-01), Shimotsuma et al.
patent: 4408878 (1983-10-01), Fischbach
patent: 4611930 (1986-09-01), Stein
patent: 4659234 (1987-04-01), Brouwer et al.
patent: 4708474 (1987-11-01), Suarez-Gonzalez
patent: 4881823 (1989-11-01), Tanaka et al.
patent: 4919542 (1990-04-01), Nulman et al.
patent: 4956538 (1990-09-01), Moslehi
patent: 4969748 (1990-11-01), Crowley et al.
patent: 4979134 (1990-12-01), Arima et al.
patent: 4984902 (1991-01-01), Crowley et al.
patent: 5011295 (1991-04-01), Krishman et al.
patent: 5029117 (1991-07-01), Pattoon
patent: 5061084 (1991-10-01), Thompson et al.
patent: 5226732 (1993-07-01), Nakos et al.
patent: 5326171 (1994-07-01), Thompson et al.
Doering, "Microelectronics Manufacturing Science and Technology Program Extends Capabilities in Integrated-Circuit Manufacturing", Microelectronics Manufacturing Science & Technology, 2-64 (1994).
Apte et al., "Rapid Thermal Processing Uniformity Using Multivariable Control of a Circularly Symmetric 3 Zone Lamp", IEEE Transactions on Semiconductor Manufacturing, 5, 180-188 (1992).
Roozeboom, "Manufacturing Equipment Issues In Rapid Thermal Processing ", Rapid Thermal Processing Science and Technology 349-423 (1993).
Pikashov et al., Determining Emissivity And True Surface Temperature By Means of A Pyrometer And An Attachment, Gas Institute, Kiev., translated form Inzhenerno-Fizicheskii Zhurnal, 16, 723-730 (1969).
Roozeboom, "Rapid Thermal Processing: Status, Problems and Options After the First 25 Years", Mat.Res.Soc.Symp.Proc. 303, 149-164 (1993).
Gyurcsik, et al., "A Model For Rapid Thermal Processing: Achieving Uniformity Through Lamp Control", IEEE Transactions on Semiconductor Manufacturing, 4, 9-13 (1991).
Sorrell et al., "Temperature Uniformity in RTP Furances", IEEE Transactions on Electron Devices 39, 75-80 (1992).
A. Honda et al., "New Radiation Thermometry Using Multiple Reflection For Temperature Measurement of Steel Sheets", American Institute of Physics 923-927.
A. Gouffe, Revue D'optique 24, 1-10 (1945) with translation.
Dilhac et al., "Temperature Control in a Rapid Thermal Processor", IEEE Transactions on Electron Devices, 39 201-203 (1992).
Norman, "Optimization of Transient Temperature Uniformity in RTP Systems", IEEE Transactions On Electron Devices 39, 205-207 (1992).
Deardorff, "Elimination of reflection errors in emissometers by using alternate apertures," Rev. Sci. Instrum., vol. 47 No. 10:1279-1282 (Oct. 1976).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of calibrating a temperature measurement system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of calibrating a temperature measurement system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of calibrating a temperature measurement system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1452420

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.