Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-04-28
1999-12-14
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, G03F 900
Patent
active
060015128
ABSTRACT:
A mask and method of systematically laying out the mask for test patterns in the frame cell region of an attenuating phase shifting mask are described. An array of sub-resolution contact holes are used in the border regions of the mask to prevent over exposure of photoresist in the regions between the device regions on a wafer due to side lobe effect. The mask and method provide for a buffer distance surrounding the features of the test patterns. The buffer distance is free of sub-resolution contact holes. When the buffer distance is correctly chosen problems due to side lobe effect at the frame cell portion of the mask are prevented.
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"ULSI Technology" by CM Chang and SM. Sze, McGraw-Hill Companies, 1996, pp. 284-289
Chen Yi-Hsu
Tzu San-De
Ackerman Stephen B.
Prescott Larry J.
Rosasco S.
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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