Method of applying photoresist by screening in the formation of

Details Method of applying photoresist by screening in the formation of Method of applying photoresist by screening in the formation of

1979-10-22

1983-03-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

427160, 427282, 430314, 430308, 430318, 430319, 430323, 430324, 430935, G03C 500

Patent

active

043768156

ABSTRACT:
This invention is directed to processes for using a light sensitive photoresist material in the manufacture of an article having a surface permanently modified in an image pattern. The process comprises applying the photoresist to a substrate through a screen, preferably as a continuous, incompletely imaged layer and thereafter, imaging and developing to provide a relief image in the photoresist layer and treating the substrate to provide a permanent image in the finished article. The process is particularly useful in the manufacture of printed circuits. The process is believed to be a departure from conventional processes in the step of screening a light sensitive photoresist material over a substrate.

REFERENCES:
patent: 3629036 (1971-12-01), Isaacson
patent: 4003877 (1977-01-01), Lipson et al.
patent: 4176602 (1979-12-01), Feddersen

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