Method of applying a resist pattern on a substrate, and resist m

Details Method of applying a resist pattern on a substrate, and resist m Method of applying a resist pattern on a substrate, and resist m

1982-03-08

1983-09-20

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430285, 430296, 430326, 430313, 430905, 430907, G03C 500, G03C 168

Patent

active

044057083

ABSTRACT:
A method of applying a resist pattern on a substrate and resist material mixture.
Resist materials which are applied in accordance with a specific resist pattern are employed in the production of integrated circuits. It has been found that the addition of a certain type of negative-working resist material, namely polystyrene and polystyrene derivatives, to positive-working resist materials results in a resist material mixture having an increased resistance to plasma etching.

REFERENCES:
patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 3900325 (1975-08-01), Christensen et al.
patent: 3996393 (1976-12-01), Cortellino et al.
patent: 4141733 (1979-02-01), Guild
patent: 4272603 (1981-06-01), Chenevert et al.
Brault et al., "A Method for Rapidly Screening Polymers as Electron Beam Resists" J. Electrochem. Soc. May 1981, pp. 1158-1161.

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