Method of applying a photosensitive resin to a substrate for use

Details Method of applying a photosensitive resin to a substrate for use Method of applying a photosensitive resin to a substrate for use

1996-10-25

1997-10-07

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430327, 430325, 430324, 162900, 1623582, 427510, 427513, G03F 730

Patent

active

056746636

ABSTRACT:
The invention comprises a method for applying a curable resin, such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a substrate; providing a curable liquid resin; providing a second material different from the curable liquid resin; applying the second material to the substrate to occupy at least some of the voids in the substrate intermediate the first and second surfaces of the substrate; applying the curable resin to the substrate; curing at least some of the resin to provide a resin layer on the substrate; and removing at least some of the second material from the substrate, wherein at least some of the second material is removed from the substrate after applying the curable resin to the substrate.

REFERENCES:
patent: Re32713 (1988-07-01), Woo
patent: 3549742 (1970-12-01), Benz
patent: 3836367 (1974-09-01), Klemm
patent: 4250172 (1981-02-01), Mutzenberg et al.
patent: 4390574 (1983-06-01), Wood
patent: 4446187 (1984-05-01), Eklund
patent: 4464432 (1984-08-01), Dost et al.
patent: 4514345 (1985-04-01), Johnson et al.
patent: 4637859 (1987-01-01), Trokhan
patent: 4795480 (1989-01-01), Boyer et al.
patent: 5098522 (1992-03-01), Smurkoski et al.
patent: 5217799 (1993-06-01), Sumi et al.
patent: 5236778 (1993-08-01), Landis et al.
patent: 5275700 (1994-01-01), Trokhan
patent: 5334289 (1994-08-01), Trokhan et al.
patent: 5346567 (1994-09-01), Barnewall
P. 291 of Ullmann's Ency. of Ind. Chem., vol. 15 (1990).
Rahne, Maurice, New Curing Techniques in the Printing, Coating and Plastics Industries, Noyes Data Corporation, Park Ridge, New Jersey 1973, pp. 1-2.
Pappas, S. Peter, "Photopolymerization" from Encyclopedia of Polymer Science and Engineering, vol. 11, John Wiley & Sons, New York 1988, pp. 186-212.

Affiliated with

Also associated with

Rating

Method of applying a photosensitive resin to a substrate for use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of applying a photosensitive resin to a substrate for use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of applying a photosensitive resin to a substrate for use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2355714