Method of application of a thin film magnetic head including a n

Details Method of application of a thin film magnetic head including a n Method of application of a thin film magnetic head including a n

1998-09-24

2000-08-22

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430312, 430319, 430324, 430328, 430330, 360126, G03F 700, G03F 740

Patent

active

06107005&

ABSTRACT:
A thin film magnetic head is capable of providing sufficient characteristics as an interlayer insulation layer even when a low temperature heat treatment is performed, and improving throughput of a process. The thin film magnetic head is fabricated by forming a protective layer 2 on a substrate 1, forming a lower shield 3 on the protective layer 2, forming a reading MR portion 4 on the lower shield 3, and forming an insulation layer 5 as a gap layer. A soft magnetic material layer of permalloy is formed as a common pole 6. On the common pole 6, a negative type photoresist 7 is applied. A patterning is performed by irradiating a light via an insulation layer pattern mask 9 and performing etching by a developer. Then, heat treatment is performed at a temperature lower than or equal to 200.degree. C. under inert atmosphere to form an interlayer insulation layer. Over this, a coil 8 is formed. In order to save a step, a negative type photoresist 7 is applied to form an interlayer insulation layer.

REFERENCES:
patent: 4933209 (1990-06-01), Anthony
patent: 5045961 (1991-09-01), Kobayashi
patent: 5448822 (1995-09-01), Wu
C.A. Cortellino et al., "Photoresist for Use in Silicon Nitride Etching Baths", IBM Technical Disclosure Bulletin, vol. 14, No. 8, Jan. 1972, p. 2309.

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