Method of and system for forming SiC crystals having...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

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C438S542000, C257S077000, C257SE21274

Reexamination Certificate

active

07608524

ABSTRACT:
In a physical vapor transport method and system, a growth chamber charged with source material and a seed crystal in spaced relation is provided. At least one capsule having at least one capillary extending between an interior thereof and an exterior thereof, wherein the interior of the capsule is charged with a dopant, is also provided. Each capsule is installed in the growth chamber. Through a growth reaction carried out in the growth chamber following installation of each capsule therein, a crystal is formed on the seed crystal using the source material, wherein the formed crystal is doped with the dopant.

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Bickermann et al. “On the preparation of vanadium doped PVT grown SiC boules with high semi-insulating yield”, Journal of Crystal Growth 254, (2003), pp. 390-399.
T. L. Straubinger, M. Bickermann, R. Weingärtner, P. J. Wellmann and A. Winnacker; “Aluminum P-Type Doping of Silicon Caribide Crystals Using A Modified Physical Vapor Transport Growth Method”; Journal of Crystal Growth 240 (2000); (pp. 117-123).

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