Method of and photomask for manufacturing optical memory element

Details Method of and photomask for manufacturing optical memory element Method of and photomask for manufacturing optical memory element

1990-05-23

1992-05-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430 5, 430322, 430495, 428 64, 428 65, 369284, 369288, 346 76L, 3461351, G03C 500

Patent

active

051127270

ABSTRACT:
A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion for forming pits of the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

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