Method of and device for repetitively imaging a mask pattern on

Details Method of and device for repetitively imaging a mask pattern on Method of and device for repetitively imaging a mask pattern on

1995-05-09

1998-09-01

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356400, G01B 902

Patent

active

058018328

ABSTRACT:
A method is described for repetitively imaging a mask pattern, on separate fields of a substrate (W), for example, for IC manufacture, which substrate fields are positioned without any field-by-field alignment so that the speed of throughput of substrates can be increased. An accurate interferometer system (50, 100, 150) having five measuring axes (MAX.sub.1, MAX.sub.2, MAX.sub.3, MAX.sub.4, MAX.sub.5) is also described, which system is intended in the first instance for use in an apparatus for performing the method, but which can also be used in a more general way in those cases where an object must be measured in five degrees of freedom.

REFERENCES:
patent: 4643577 (1987-02-01), Roth et al.
patent: 4655594 (1987-04-01), Wittekoek et al.
patent: 4778275 (1988-10-01), Van Den Brink
patent: 4784490 (1988-11-01), Wayne
patent: 4814625 (1989-03-01), Yabu
patent: 4881816 (1989-11-01), Zanoni
patent: 5064289 (1991-11-01), Bockman

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