Method of and device for providing thin layers by cathode sputte

Details Method of and device for providing thin layers by cathode sputte Method of and device for providing thin layers by cathode sputte

1976-06-10

1977-09-20

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118 48, 204298, 427248R, C23C 1500

Patent

active

040495230

ABSTRACT:
A mould and supporting dish for dry-compressed powder targets which are constructed so that adsorbed residual gases can readily escape during the evacuation process of the cathode sputtering device via substantially all the surfaces of the powder target, so that the powder target is not torn or its structure damaged during the evacuation process. The adsorbed residual gases can escape through apertures in the bottom and side wall of the supporting dish.

REFERENCES:
patent: 3464907 (1969-09-01), Froemel et al.
patent: 3791955 (1974-02-01), Klein
patent: 3976555 (1976-08-01), Von Hartel
A. Zozime et al., "Achievement of Isolated & Cooled Targets for a Cathodic Sputtering Device," J. Phys. E. Sci. Inst., vol. 5, No. 5, May 1972, pp. 417-419.

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