Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2011-06-28
2011-06-28
Choi, Jacob Y (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C156S345440, C156S345470, C118S7230ER, C219S121480, C134S001100
Reexamination Certificate
active
07969095
ABSTRACT:
The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
REFERENCES:
patent: 5414324 (1995-05-01), Roth et al.
patent: 6046546 (2000-04-01), Porter et al.
patent: 6147452 (2000-11-01), Kunhardt et al.
patent: 6299948 (2001-10-01), Gherardi et al.
International Search Report and Written Opinion mailed Apr. 12, 2005 in corresponding International Application Serial No. PCT/NL2004/000897 filed Dec. 22, 2004.
E. Aldea et al., “Generation of a Stable Atmospheric Glow in a DBD Configuration,” International Symposium on Plasma Chemistry Proceedings, Jun. 22, 2003, XP009034055, pp. 1-6.
P. Bletzinger and B. N. Ganguly, “The effect of displacement current on fast-pulsed dielectric barrier discharges,” Journal of Physics D: Applied Physics, Institute of Physics Publishing, Ltd., UK, vol. 36, No. 13, Jun. 18, 2003, pp. 1550-1552, XP002310826, ISSN: 0022-3727.
T. Yokohama et al., “The mechanism of the stabilisation of glow plasma at atmospheric pressure,” Journal of Physics D: Applied Physics, Institute of Physics Publishing, Ltd., UK, vol. 23, No. 8, 1990, pp. 1125-1128, XP002322399, ISSN: 0022-3727.
Aldea Eugen
Bouwstra Jan Bastiaan
de Vries Hindrik Willem
Van De Sanden Mauritius Cornelius Maria
Alemu Ephrem
Choi Jacob Y
Davidson Berquist Jackson & Gowdey LLP
Fuji Photo Film B.V.
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