Method of and arrangement for etching an etch material consistin

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156640, 156656, 1566591, 156902, B44C 122, C23F 0000

Patent

active

050715089

ABSTRACT:
The invention concerns a method of etching an etch material consisting at least partly of metal and an arrangement for implementing that method.
According to the invention, the etchant is applied through jet assemblies arranged perpendicularly to each other on the top and the bottom side of the etch material. During the passage of the etch material, the spray pressure at the jet assemblies or the jets may be set to constant values and/or be individually controlled as a function of the quantity of metal to be etched off the top and the bottom side. The invention is particularly suitable for etching circuit boards, whose conductors on the top and the bottom side are arranged perpendicularly to each other.

REFERENCES:
patent: 3401068 (1968-09-01), Benton
patent: 3788912 (1974-01-01), Frantzen et al.
patent: 3808067 (1974-04-01), Brown
patent: 4352994 (1982-10-01), Inzoli et al.
patent: 4397708 (1983-08-01), Frantzen
patent: 4741798 (1988-05-01), Haas
patent: 4772365 (1988-09-01), Haas
Adjustable Nozzles for Spray Etchers, Holemann et al., IBM Technical Disclosure Bulletin, vol. 13, No. 12, May 1971.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of and arrangement for etching an etch material consistin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of and arrangement for etching an etch material consistin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and arrangement for etching an etch material consistin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1038281

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.