Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
2006-07-18
2006-07-18
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S001000, C134S002000, C134S025400, C134S026000, C134S034000, C134S036000, C134S042000
Reexamination Certificate
active
07077915
ABSTRACT:
Organic matter and metal impurities present on the surface of a photomask are removed. Foreign matter still adhering to the surface of the photomask is removed with H2gas dissolved water. The photomask is dried. Thus provided is a method of washing a photomask in a manner which permits attaining an effect of removing foreign matter equivalent or superior to that of a conventional method with a small amount of chemical solution and reducing the amounts of chemicals and high purity water.
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Nagamura Yoshikazu
Usui Hozumi
Yamanaka Koji
Yoshioka Nobuyuki
Kornakov M.
M. Watanabe & Co., Ltd.
Organo Corporation
Renesas Technology Corp.
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