X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1994-07-05
1995-02-14
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 84, 378 35, 2504921, 359846, G21K 502
Patent
active
053902289
ABSTRACT:
A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.
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A. M. Hawryluk, et al., "Reflection Mask Technology for X-ray Projection Lithography", Journal of Vacuum Science & Technology, B7, No. 6, pp. 1702-1704 (Nov./Dec. 1989).
K. Asch, et al., "Method of Keeping a Proximity Printing Mask at a Constant Temperature", IBM Technical Disclosure Bulletin, vol. 26, No. 7A, p. 3261 (Dec. 1983).
Fukuda Yasuaki
Hayashida Masami
Niibe Masahito
Canon Kabushiki Kaisha
Porta David P.
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