Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1994-07-19
1996-07-02
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
H01L 2100
Patent
active
055318622
ABSTRACT:
A method of and apparatus removes foreign particles in a vacuum or in a dry atmosphere before and in continuation to performing a dry process, such as a dry etching or a sputtering process. For this purpose, the foreign particles are separated from a substrate by subjecting the foreign particles to a force for separating the foreign particles from the substrate and a vibrating force for vibrating the foreign particles at the same time, and then the frequency of vibration is changed to match the resonant frequency of a vibration system formed by each of the foreign particles and the substrate, thereby applying a vibration energy to the foreign particles due to resonance. The separated foreign particles floating in a plasma are drawn to an electrode having a potential which is controlled such that a flowing-in of electrons is reduced, and the particles are discharged from the inside of the plasma. In this way, the foreign particles can be reduced and the yield of the product in manufacturing semiconductors and TFTs can be promoted. Further, a cleaning step, a film forming operation, an etching process and the like can continuously be processed, thereby achieving a reduction in steps and a promotion in productivity.
REFERENCES:
patent: 5247954 (1993-09-01), Grant et al.
patent: 5377709 (1995-01-01), Shibano
Goree et al., "Particulate Release From Surfaces Exposed to Plasma", J. Vac. Sci. Technol. A10(6), Nov./Dec. 1992, pp. 3540-3544.
Ohara Kazuhiro
Otsubo Toru
Sasaki Ichirou
Sasaki Shinji
Suzuki Yasumichi
Hitachi , Ltd.
Powell William
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