Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Reexamination Certificate
2006-11-28
2006-11-28
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Using solid work treating agents
C134S001000, C134S001300, C134S006000, C134S009000, C134S026000, C134S030000, C134S031000, C134S032000, C134S034000, C134S037000, C034S266000, C034S275000
Reexamination Certificate
active
07141123
ABSTRACT:
A cleanling apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface by physical force, and another part in which a fluid including a gaseous reactant is directed onto the surface of the substrate while the surface is irradiated to cause a chemical reaction between the reactant and organic contaminants on the surface, to chemically removing the organic contaminants. In the method of cleaning the substrate, the physical and chemical cleaning processes are carried out in a separate manner from one another so that the frozen particles of the aerosol are not exposed to the effects of the light used in irradiating the surface of the substrate. Therefore, the effectiveness of the aerosol in cleaning the substrate is maximized.
REFERENCES:
patent: 4909914 (1990-03-01), Chiba et al.
patent: 5081068 (1992-01-01), Endo et al.
patent: 5125979 (1992-06-01), Swain et al.
patent: 5209028 (1993-05-01), McDermott et al.
patent: 5315793 (1994-05-01), Peterson et al.
patent: 5372652 (1994-12-01), Srikrishnan et al.
patent: 5613509 (1997-03-01), Kolb et al.
patent: 5699679 (1997-12-01), Wu et al.
patent: 5759892 (1998-06-01), Wang et al.
patent: 5967156 (1999-10-01), Rose et al.
patent: 6066032 (2000-05-01), Borden et al.
patent: 3-159237 (1991-07-01), None
patent: 2000315672 (2000-11-01), None
Chung Jong-ho
Lee Kun-tack
Lee Moon-hee
Shim Woo-gwan
Kornakov M.
Samsung Electronics Co,. Ltd.
Volentine Francos & Whitt
LandOfFree
Method of and apparatus for removing contaminants from... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of and apparatus for removing contaminants from..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of and apparatus for removing contaminants from... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3672495