Method of and apparatus for measuring pattern positions

Details Method of and apparatus for measuring pattern positions Method of and apparatus for measuring pattern positions

1995-09-07

1996-07-23

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

25055929, 356375, G01B 1130

Patent

active

055395210

ABSTRACT:
A pattern position measuring method of measuring two-dimensional positions of a hyperfine pattern formed on the surface of a substrate. This method comprises a pattern position measuring step of measuring the positions of the pattern in a first flexural configuration produced in a supported state where the measured substrate is supported in a first plurality of positions of the measured substrate on a stage, a flexural configuration detecting step of detecting the first flexural configuration of the surface of the measured substrate, and a correcting step of correcting the pattern positions in the first flexural configuration that are measured by the pattern position measuring step to pattern positions in a second flexural configuration on the basis of the pattern positions in the first flexural configuration that are measured by the pattern position measuring step, the first flexural configuration detected by the flexural configuration detecting step and the previously stored second flexural configuration of the surface of the measured substrate which is produced when the measured substrate is supported in a second plurality of positions different from the first plurality of positions.

REFERENCES:
patent: 4730927 (1988-03-01), Ototake et al.
patent: 5085517 (1992-02-01), Chadwick et al.
patent: 5386294 (1995-01-01), Ototake et al.

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