Method of and apparatus for manufacturing semiconductor thin...

Details Method of and apparatus for manufacturing semiconductor thin... Method of and apparatus for manufacturing semiconductor thin...

2008-04-08

2008-04-08

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S487000, C117S008000, C257SE21134

Reexamination Certificate

active

07354810

ABSTRACT:
A method of manufacturing a semiconductor thin film includes (A) forming an amorphous semiconductor film on a substrate, (B) irradiating a beam to a surface of the amorphous semiconductor film such that a predetermined region of the amorphous semiconductor film is melted and solidified to form a crystallized semiconductor film, and (C) scanning the beam in a first direction. A second direction is a direction on the surface of the amorphous semiconductor film perpendicular to the first direction. A length along the second direction of a cross section of the beam is substantially equal to or less than two times a width along the second direction of the crystallized semiconductor film.

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