Method of and apparatus for electronically controlling r.f. ener

Details Method of and apparatus for electronically controlling r.f. ener Method of and apparatus for electronically controlling r.f. ener

1996-03-29

1999-04-06

Paschall, Mark H.

Electric heating

Metal heating

By arc

21912143, 219709, B23K 1000

Patent

active

058921982

ABSTRACT:
A load including a plasma discharge in a plasma processing chamber is matched to a variable frequency source so the power reflected from the load is substantially minimized. The source voltage or a variable reactance of a matching network between the source and load is controlled so the load has a preset power level, as detected by the difference between the source output power and the power reflected from the load.

REFERENCES:
patent: 4673589 (1987-06-01), Standley
patent: 5179264 (1993-01-01), Cuomo et al.
patent: 5223457 (1993-06-01), Mintz et al.
patent: 5321222 (1994-06-01), Bible et al.
patent: 5383019 (1995-01-01), Farrell et al.
patent: 5521360 (1996-05-01), Johnson et al.

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