Method of and apparatus for controlling thermal gradient in a lo

Details Method of and apparatus for controlling thermal gradient in a lo Method of and apparatus for controlling thermal gradient in a lo

1992-07-28

1993-07-20

Hepperle, Stephen M.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 34, 34218, F26B 504

Patent

active

052282082

ABSTRACT:
After a heated object such as a processed wafer is placed inside a load lock chamber in a vacuum condition, a specified limited amount of vent gas is introduced and the pressure inside the chamber is maintained at an intermediate level for a specified length of time so a to control its thermal gradient. After the specified length of time, the chamber is completely vented. Both software and hardware implementations are possible for this staged vent.

REFERENCES:
patent: 3918169 (1975-11-01), De Smet
patent: 3983637 (1976-10-01), Johnson
patent: 4115596 (1978-09-01), Knutrud
patent: 4187616 (1980-02-01), Yamada et al.
patent: 4512391 (1985-04-01), Harra
patent: 4611469 (1986-09-01), Musschoot
patent: 4724621 (1988-02-01), Hobson et al.
patent: 4768291 (1988-09-01), Palmer

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