Method of and apparatus for controlling reactive impedances of a

Wave transmission lines and networks – Automatically controlled systems – Impedance matching

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364482, H03H 740

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active

056892152

ABSTRACT:
An r.f. field is supplied by a reactive impedance element to a plasma in a vacuum plasma processing chamber. The element and source are connected via a matching network including first and second variable reactances that control loading of the source and tuning a load, including the reactive impedance element and the plasma, to the source. The values of the first and second variable reactances are changed to determine the amount the first variable reactance is to change for each unit change of the second variable reactance to attain the best match between the impedances seen looking into and out of output terminals of the r.f. source. Then the values of the first and second variable reactances are varied simultaneously based on the determination until the best impedance match between the impedances seen looking into and out of output terminals of the r.f. source is attained.

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patent: 4965607 (1990-10-01), Wilkins et al.
patent: 5187454 (1993-02-01), Collins et al.
patent: 5195045 (1993-03-01), Keane et al.
patent: 5225847 (1993-07-01), Roberts et al.

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