Method of analysis of distribution of concentration of substrate

Radiant energy – Inspection of solids or liquids by charged particles – Methods

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250282, 250309, H01J 3728, H01J 4900, B01D 5944

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056378700

ABSTRACT:
A method of analysis of the distribution of concentration of a substrate including: a step of preparing a plurality of types of sample substrates whose distribution of concentration is to be analyzed; a step of forming on the surfaces of those substrates dummy films of a material different from the substrates or etching the surfaces of the plurality of sample substrates to different depths; in the case of the dummy films; a step of introducing into the sample substrates specific impurities from the direction of the dummy films under substantially identical conditions and then a step of removing the dummy films; a step of performing mass analysis from the sides of the sample substrates; and a step of sequentially calculating the difference in the results of the mass analysis among the sample substrates.

REFERENCES:
patent: 3840743 (1974-10-01), Tamura et al.
patent: 4510387 (1985-04-01), Izumi et al.
patent: 4835115 (1989-05-01), Eklund
patent: 5350919 (1994-09-01), Hirano et al.
patent: 5442174 (1995-08-01), Kataoka et al.
patent: 5502305 (1996-03-01), Kataoka
patent: 5521377 (1996-05-01), Kataoka et al.

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