Method of aligning a particle-beam-generated pattern to a...

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

Reexamination Certificate

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Details

C430S030000, C430S296000, C430S942000

Reexamination Certificate

active

07625679

ABSTRACT:
A significant improvement in the alignment of a particle-beam-generated pattern relative to a pre-existing pattern present on a substrate has been accomplished using optical measurement to register the particle beam to the pre-existing pattern. Use of a position fiducial which can be accurately measured by both an optical microscope and a particle beam axis is used to align a pre-existing pattern with a particle-beam-generated pattern during writing of the particle-beam-generated pattern. Registration of the pre-existing pattern to the fiducial and registration of the particle beam axis to the fiducial periodically during production of the particle-beam-generated pattern continually provides an improvement in the overall alignment of the pattern being created to the pre-existing pattern on the substrate. The improved method of alignment can be used to correct for drift, or thermal expansion, or gravitational sag, by way of example.

REFERENCES:
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patent: 5798947 (1998-08-01), Ye et al.
patent: 6424879 (2002-07-01), Chilese et al.
patent: 6883158 (2005-04-01), Sandstrom et al.
patent: 7388213 (2008-06-01), Sullivan
patent: WO 03/010523 (2001-02-01), None

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