Method of aligning a mask in photolithographic process

Details Method of aligning a mask in photolithographic process Method of aligning a mask in photolithographic process

1997-04-24

1998-12-29

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

356399, 356401, G03F 900

Patent

active

058539271

ABSTRACT:
A method for aligning a mask in a photolithographic process is provided. This method allows the technician to easily see by the naked eye or by use of a microscope any misalignment of the mask, such that the misalignment can be easily corrected. The method includes providing the mask with an opaque frame having four corners, forming a plurality of alignment patterns on a platform where the mask is to be placed, and performing an alignment of the mask by visually checking for misalignment of the mask with reference to the alignment patterns on the platform. The alignment patterns may include a plurality of parallel-spaced bars both in the crosswise and lengthwise directions, to allow the technician to visually check for any misalignment of the mask and thereby shift the mask pellicle to the aligned position.

REFERENCES:
patent: 5552251 (1996-09-01), Hwang
patent: 5674650 (1997-10-01), Dirksen et al.

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