Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1986-09-24
1988-10-18
Rosenberger, R. A.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356150, G01B 1100
Patent
active
047782757
ABSTRACT:
A method and an arrangement for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks wherein by using two separate alignment systems (AS.sub.1, AS.sub.2) which are each associated with one mask mark (M.sub.1, M.sub.2) and which are each used for aligning the substrate marks (P.sub.1, P.sub.2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus and in addition it is possible to detect magnification errors.
REFERENCES:
patent: 4062623 (1977-12-01), Suzuki et al.
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4573791 (1986-03-01), Phillips
"Automatic Alignment System for Optical Projection Printing" Bouwhuis et al, IEEE Transactions on Electron Devices, vol. Ed 26, #4, 4/1979.
van den Brink Martinus A.
Van Eijk Jan
ASM Lithography
Cooper Crystal D.
Mayer Robert T.
Rosenberger R. A.
U.S. Philips Corp.
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