Method of aligning a mask and a substrate relative to each other

Details Method of aligning a mask and a substrate relative to each other Method of aligning a mask and a substrate relative to each other

1986-09-24

1988-10-18

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

356150, G01B 1100

Patent

active

047782757

ABSTRACT:
A method and an arrangement for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks wherein by using two separate alignment systems (AS.sub.1, AS.sub.2) which are each associated with one mask mark (M.sub.1, M.sub.2) and which are each used for aligning the substrate marks (P.sub.1, P.sub.2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus and in addition it is possible to detect magnification errors.

REFERENCES:
patent: 4062623 (1977-12-01), Suzuki et al.
patent: 4251160 (1981-02-01), Bouwhuis et al.
patent: 4573791 (1986-03-01), Phillips
"Automatic Alignment System for Optical Projection Printing" Bouwhuis et al, IEEE Transactions on Electron Devices, vol. Ed 26, #4, 4/1979.

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