Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Patent
1998-02-13
2000-11-07
Grant, William
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
700123, 62480, 102200, 1022022, G06F 1900
Patent
active
06144894&
ABSTRACT:
A method for controlling the output power of the magnetron generator, where the method and apparatus defines an ignition power level that ensures that the magnetron generator provides a minimal level of power that will ignite the plasma and not result in a detrimental impedance mismatch between the magnetron and an applicator of a remote plasma source. When the user of the wafer processing system requests a power level (i.e., a requested power level) that is below this ignition level, the ignition level is used to ignite the plasma and the output power of the magnetron is gradually decreased to the requested power level. The decrease is performed within a predetermined time period.
REFERENCES:
patent: 5002632 (1991-03-01), Loewenstein et al.
patent: 5306379 (1994-04-01), Kamide
patent: 5489362 (1996-02-01), Steinhardt et al.
patent: 5508227 (1996-04-01), Chan et al.
Tai, "A Fundamental Theorem On The Maximum Frequency Of Coherent Oscillations By Robert S. Elliott", IEEE , pp. 802, 1992.
Ayres et al., "Universal Scaling And Initial Energy Distribution For Magneton", IEEE, pp. 180, 1990.
Applied Materials Inc.
Grant William
Marc McDieunel
Patterson Thomason Moser
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