Method of achieving CD linearity control for full-chip CPL...

Details Method of achieving CD linearity control for full-chip CPL... Method of achieving CD linearity control for full-chip CPL...

2007-02-20

2010-02-23

Luu, Thanh X (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C430S005000, C716S030000

Reexamination Certificate

active

07667216

ABSTRACT:
A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.

REFERENCES:
patent: 5184021 (1993-02-01), Smith
patent: 5302477 (1994-04-01), Dao et al.
patent: 5348826 (1994-09-01), Dao et al.
patent: 5354632 (1994-10-01), Dao et al.
patent: 5384219 (1995-01-01), Dao et al.
patent: 5424154 (1995-06-01), Borodovsky
patent: 5618643 (1997-04-01), Dao et al.
patent: 5633102 (1997-05-01), Toh et al.
patent: 5840448 (1998-11-01), Borodovsky et al.
patent: 5906901 (1999-05-01), Tanimoto
patent: 5935733 (1999-08-01), Scott et al.
patent: 6114071 (2000-09-01), Chen et al.
patent: 6269472 (2001-07-01), Garza et al.
patent: 6383697 (2002-05-01), Vladimirsky et al.
patent: 6383719 (2002-05-01), Bula et al.
patent: 6458495 (2002-10-01), Tsai et al.
patent: 6482555 (2002-11-01), Chen et al.
patent: 6541167 (2003-04-01), Petersen et al.
patent: 6562522 (2003-05-01), Yan
patent: 6605481 (2003-08-01), Wu et al.
patent: 6623895 (2003-09-01), Chen et al.
patent: 6641959 (2003-11-01), Yan
patent: 6660649 (2003-12-01), Dao et al.
patent: 6664009 (2003-12-01), Liu
patent: 7211815 (2007-05-01), Broeke et al.
patent: 2001/0021476 (2001-09-01), Gans et al.
patent: 0 713 142 (1996-05-01), None
patent: 1 122 603 (2001-08-01), None
patent: 1 152 289 (2001-11-01), None
patent: 1 398 666 (2004-03-01), None
patent: WO 02/075454 (2002-09-01), None
Watanabe, Hisashi., et al. “ Sub-quarter-micron gate pattern fabrication using a transparent phase shifting mask.” J. Vac. Sci. Technol. B 9 (6) Nov./Dec. 1991, pp. 3172-3175.
Watanabe, H., et al. “Transparent Phase Shifting Mask.” Electron Devices Meeting,1990, Technical Digest., International, IEDM 90-821 to 90-824, pp. 33.2.1 to 33.2.4.
Levenson, Marc D., et al. “SCAA mask exposures and Phase Phirst design for 110nm and below.” Optical Microlithography XIV, Proceedings of SPIE vol. 4346 (2001), pp. 817-826.
Kenny, K.H. Toh., et al.“Optical Lithography and Chromeless Phase-Shifted Masksm,” SPIE vol. 1463, Optical/Laser Microlithography IV (1991) pp. 74-86.
Levenson, Marc D., et al “Improving Resolution in Photolithography with a Phase-Shifting Mask.” IEEE Transactions on Electron Devices, vol. Ed-29, No. 12, Dec. 1982, pp. 1828-1836.
Erdely, Miklos., et al.“Enhanced Microlithography Using Phase Shifting and Off-axis Illumination.” Jpn. J. Appl. Phys. vol. 34, (1995) Pt. 2, No. 12A, pp. 1629-1631.
Matsuso, Takahiro., et al. “Feasibility Study of an Embedded Transparent Phase-Shifting Mask in ArF Lithography.” Optical Microlithography XIII, Proceedings of SPIE, vol. 4000 (2000), pp. 443-451.
Hsu, Chungwei., et al. “ Patterning 0.1 um device by using hybrid PSM.” Optical Microlithography XIV, Proceedings of SPIE, vol. 4346 (2001), pp. 441-451.

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