Method of achieving CD linearity control for full-chip CPL...

Details Method of achieving CD linearity control for full-chip CPL... Method of achieving CD linearity control for full-chip CPL...

2007-05-01

2007-05-01

Luu, Thanh X. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C716S030000, C430S005000

Reexamination Certificate

active

10659715

ABSTRACT:
A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.

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