Method of accelerating test of semiconductor device

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S014000, C438S018000, C257S048000

Reexamination Certificate

active

07485475

ABSTRACT:
Semiconductor elements composing a semiconductor device are formed on a semiconductor substrate. Wirings composed of copper or an alloy mainly composed of copper are formed in wiring layers through interlayer insulation films to connect the semiconductor elements to each other. When the wirings are formed, a temperature of the wirings is held in a first temperature zone covering ±40° C. of a temperature at which a stress migration is most accelerated.

REFERENCES:
patent: 5874777 (1999-02-01), Ohmi et al.
patent: 5930587 (1999-07-01), Ryan
patent: 6348741 (2002-02-01), Ogino et al.
patent: 6946723 (2005-09-01), Satoh et al.
patent: 2002/0098681 (2002-07-01), Hu et al.
patent: 3-254126 (1991-11-01), None
patent: 10-12687 (1998-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of accelerating test of semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of accelerating test of semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of accelerating test of semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4053318

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.