Method for wafer scrubbing

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 18, 134 254, 134 32, 134 34, B08B 700, B08B 704

Patent

active

055296386

ABSTRACT:
A wet indexer for receiving a cassette of wafers from a previous processing station that have not been allowed to dry. The wet indexer then keeps the wafers submersed in processing solution before and during indexed transmission to later cleaning stations.

REFERENCES:
patent: 3664872 (1972-05-01), Frank et al.
patent: 3970471 (1976-07-01), Bankes et al.
patent: 4557785 (1985-12-01), Ohkuma

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for wafer scrubbing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for wafer scrubbing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for wafer scrubbing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2186271

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.