Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Reexamination Certificate
2004-06-01
2011-12-13
Carrillo, Bibi (Department: 1711)
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
C134S002000, C134S010000, C134S011000, C134S021000, C134S022100, C134S022110, C134S026000, C134S034000, C134S036000, C134S037000, C134S042000
Reexamination Certificate
active
08075704
ABSTRACT:
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.
REFERENCES:
patent: 4276368 (1981-06-01), Heller et al.
patent: 4851018 (1989-07-01), Lazzari et al.
patent: 4936922 (1990-06-01), Cherry et al.
patent: 5013335 (1991-05-01), Marcus
patent: 5160512 (1992-11-01), Talu
patent: 5169272 (1992-12-01), Bonora et al.
patent: 5230721 (1993-07-01), Ohmi
patent: 5346518 (1994-09-01), Baseman et al.
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5378283 (1995-01-01), Ushikawa
patent: 5425793 (1995-06-01), Mori et al.
patent: 5540757 (1996-07-01), Jordan, Sr.
patent: 5602683 (1997-02-01), Straaijer et al.
patent: 5607647 (1997-03-01), Kinkead
patent: 5644855 (1997-07-01), McDermott et al.
patent: 5661225 (1997-08-01), Ridgeway et al.
patent: 5676737 (1997-10-01), Whitlock
patent: 5786042 (1998-07-01), Inoue et al.
patent: 5806574 (1998-09-01), Yamashita et al.
patent: 5810062 (1998-09-01), Bonora et al.
patent: 5833726 (1998-11-01), Kinkead et al.
patent: 5833738 (1998-11-01), Carrea et al.
patent: 5846338 (1998-12-01), Bonora et al.
patent: 5869401 (1999-02-01), Brunemeier et al.
patent: 5938854 (1999-08-01), Roth
patent: 5944602 (1999-08-01), Grundy
patent: 5968232 (1999-10-01), Whitlock
patent: 5988233 (1999-11-01), Fosnight et al.
patent: 6056026 (2000-05-01), Fosnight et al.
patent: 6116858 (2000-09-01), Narabayashi
patent: 6124211 (2000-09-01), Butterbaugh et al.
patent: 6146531 (2000-11-01), Matheson
patent: 6164664 (2000-12-01), Fosnight et al.
patent: 6199604 (2001-03-01), Miyajima
patent: 6221132 (2001-04-01), Dong et al.
patent: 6249932 (2001-06-01), Chu et al.
patent: 6319297 (2001-11-01), Fosnight
patent: 6364762 (2002-04-01), Kaveh et al.
patent: 6391090 (2002-05-01), Alvarez, Jr. et al.
patent: 6422823 (2002-07-01), Bernard et al.
patent: 6427703 (2002-08-01), Somekh
patent: 6443191 (2002-09-01), Murayama et al.
patent: 6461410 (2002-10-01), Abe et al.
patent: 6473996 (2002-11-01), Tokunaga
patent: 6507390 (2003-01-01), Ivaldi
patent: 6610123 (2003-08-01), Wu et al.
patent: 6638341 (2003-10-01), Spiegelman et al.
patent: 6652667 (2003-11-01), Ahmadi et al.
patent: 6696367 (2004-02-01), Aggarwal et al.
patent: 6701972 (2004-03-01), Dickinson et al.
patent: 6710845 (2004-03-01), Wu et al.
patent: 6724460 (2004-04-01), Van Schaik et al.
patent: 6729041 (2004-05-01), Shindo et al.
patent: 6747729 (2004-06-01), Pril et al.
patent: 6755221 (2004-06-01), Jeong et al.
patent: 6758876 (2004-07-01), Suzuki et al.
patent: 6797029 (2004-09-01), Lederer et al.
patent: 6867153 (2005-03-01), Tokunaga
patent: 6899145 (2005-05-01), Aggarwal
patent: 6913654 (2005-07-01), Alvarez, Jr. et al.
patent: 6919102 (2005-07-01), Chen
patent: 6922867 (2005-08-01), Hao
patent: 6974505 (2005-12-01), Shih et al.
patent: 7113254 (2006-09-01), Van Der Net et al.
patent: 7189291 (2007-03-01), Spiegelman et al.
patent: 7208428 (2007-04-01), Hishiya et al.
patent: 7335244 (2008-02-01), Kisakibaru et al.
patent: 7377982 (2008-05-01), Alvarez et al.
patent: 2002/0018189 (2002-02-01), Mulkens et al.
patent: 2002/0088478 (2002-07-01), Degendt et al.
patent: 2002/0124906 (2002-09-01), Suzuki et al.
patent: 2002/0129707 (2002-09-01), Tanaka et al.
patent: 2002/0132480 (2002-09-01), Shindo et al.
patent: 2002/0192129 (2002-12-01), Shamouilian et al.
patent: 2003/0096193 (2003-05-01), Van Schaik et al.
patent: 2004/0000328 (2004-01-01), Liu et al.
patent: 2004/0145716 (2004-07-01), Wu et al.
patent: 2004/0237777 (2004-12-01), Alvarez et al.
patent: 2004/0238013 (2004-12-01), Spiegelman et al.
patent: 2005/0017198 (2005-01-01), Van Der Net et al.
patent: 2005/0087133 (2005-04-01), Shindo et al.
patent: 2005/0111935 (2005-05-01), Kim et al.
patent: 2005/0205114 (2005-09-01), Alvarez, Jr. et al.
patent: 2006/0118138 (2006-06-01), Spiegelman et al.
patent: 2006/0285091 (2006-12-01), Parekh et al.
patent: 2007/0030463 (2007-02-01), Parekh et al.
patent: 2007/0114467 (2007-05-01), Van Der Net et al.
patent: 2007/0137676 (2007-06-01), Spiegelman et al.
patent: 2007/0144118 (2007-06-01), Alvarez et al.
patent: 2009/0272461 (2009-11-01), Alvarez, Jr. et al.
patent: 199 24 058 (2000-11-01), None
patent: 0 617 573 (1994-09-01), None
patent: 0 867 924 (1998-09-01), None
patent: 1 067 583 (2001-01-01), None
patent: 1 182 694 (2002-02-01), None
patent: 1 343 202 (2003-09-01), None
patent: 3-225824 (1991-10-01), None
patent: 4305927 (1992-10-01), None
patent: 10085634 (1998-07-01), None
patent: 2000093904 (2000-04-01), None
patent: 2002-217157 (2002-08-01), None
patent: 117769 (2007-07-01), None
patent: 124510 (2009-02-01), None
patent: WO 98/42362 (1998-10-01), None
patent: WO 99/62955 (1999-12-01), None
patent: WO 01/37329 (2001-05-01), None
patent: WO 02/47142 (2002-06-01), None
patent: WO 2004/077015 (2004-09-01), None
patent: WO 2004/077015 (2004-09-01), None
patent: WO 2004/112117 (2004-12-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/010619 (2005-02-01), None
patent: WO 2005/078771 (2005-08-01), None
patent: WO 2005/078771 (2005-08-01), None
patent: WO 2007/019105 (2007-02-01), None
patent: WO 2007/120451 (2007-10-01), None
Air composition, Engineering Tool Box, Dec. 24, 2008.
Handbook of Semiconductor Wafer Cleaning Technology, Science, Technology, and Applications, Werner Kern Associates, eds., (NJ: Noyes Publications) pp. 88-89 (1993).
Veillerot, Marc, “A Method for Measuring AMC Concentrations Inside Wafer Containers,” Materials Integrity Management Symposium 2003.
Martin, Ray et al., “Status of Microenvironment Gas Purge in the Semiconductor Industry,” Materials Integrity Management Symposium 2003.
Davidson, John, “The Expanding Role of Bare Reticle Stockers in Photolithography,” Materials Integrity Management Symposium 2003.
Veillerot et al., “Organic Contamination: Purge Gas Impace in Plastic Storage Boxes,” Solid State Phenomena, vol. 92, pp. 105-108 (2003).
Veillerot et al., “Testing the use of purge gas in wafer storage and transport containers,” [online] 1997-2003 [retrieved Nov. 10, 2004]. Retrieved from the Internet <URL: http://www.micromagazine.com/archive/03/08/verllerot.html.
Pearlstein et al., “Evaluating electronics-grade gas-line purging requirements,” [online] Mar. 2001 [retrieved Oct. 18, 2004]. Retrieved from the Internet <URL: http://sst.pennnet.com/Articles/Article—Display.cfm?Section=ARCHI&ARTICLE—ID=95491&VERSION—NUM=1&p=5.
Office Action, Israel Patent Application No. 172210, dated Jun. 8, 2009, in Hebrew with English translation.
Notice of Rejection, Japanese Patent Application No. 2006-515059, dated Sep. 10, 2009, English translation.
Communication Pursuant to Article 94(3) EPC, European Patent Application No. 04753969.7-2113, dated May 13, 2009.
Partial European Search Report for EP 09170473 dated Sep. 30, 2009.
Office Action from European Patent Office for 05712656.7-2222, dated May 2, 2007.
Office Action from European Patent Office for 05712656.7-2222, dated Oct. 5, 2007.
Office Action from European Patent Office for 05712656.7-2222, dated Apr. 11, 2008.
Office Action from European Patent Office for 05712656.7-2222, dated Dec. 12, 2008.
Invitation to Respond to Written Opinion for 200605062-9, dated Oct. 11, 2007.
Examination Report for 200605062-9, dated May 26, 2008.
Decision of Granting Patent Right for Invention for 200580009743.4, dated Oct. 31, 2008.
Notification of First Office Action for 200580009743.4, dated Aug. 17, 2007.
Chinese Patent Application—Text of the Second Office Action for 200580009743.4
Alvarez, Jr. Daniel
Holmes Russell J.
Spiegelman Jeffrey J.
Tram Allan
Carrillo Bibi
Entegris, Inc.
Hamilton Brook Smith & Reynolds P.C.
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