Method for the rapid deposition with low vapor pressure reactant

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505734, 505737, 505704, 427 62, 4272553, 4272552, 4272551, 4272481, B05D 512, C23C 1600

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active

051089831

ABSTRACT:
A method for applying coatings to substrates using chemical vapor deposition with low vapor pressure reagents is disclosed which comprises the steps of: (a) placing a substrate in a furnace means; (b) directly introducing powder reagents by a powder feeder means into said furnace means; and (c) vaporizing and reacting said reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate, wherein said coating can be an oxide superconductor.

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