Method for the production of thin layer chip resistors

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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Details

C430S319000, C430S322000, C430S945000, C216S016000, C216S065000, C216S066000, C438S382000, C438S940000

Reexamination Certificate

active

06998220

ABSTRACT:
A method for manufacturing thin-film chip resistors, in which method a resistor layer (14) and a contact layer (15, 16) are applied onto the upper surface of a substrate (10) and structured using laser light so as to form on said substrate (10) a plurality of adjacent, separate resistor lands (24) having a predetermined approximate resistance value, allows the simplified and cheap manufacturing by performing the electrical insulation of the resistor elements (24) and the structuring of the individual resistor lands (24) for the entire resistor land simultaneously by means of a laser-lithographic direct exposure method.

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patent: 4468414 (1984-08-01), Van Vonno
patent: 4594265 (1986-06-01), Van Vonno et al.
patent: 6004734 (1999-12-01), Berg
patent: 6322711 (2001-11-01), Chen
patent: 6365483 (2002-04-01), Lin et al.
patent: 44 29 794 (1996-02-01), None
patent: 1 374 257 (2004-09-01), None
patent: 04178503 (1992-06-01), None

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