Method for the production of photo-patterned carbon electronics

Details Method for the production of photo-patterned carbon electronics Method for the production of photo-patterned carbon electronics

2009-07-06

2011-12-13

Menz, Laura (Department: 2813)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

C438S057000, C438S542000

Reexamination Certificate

active

08076218

ABSTRACT:
A method for the manufacture of carbon based electrical components is herein presented. In the method a wafer substrate is provided upon which a first layer of carbon based semiconductor is deposited. The first layer of carbon based semiconductor is introduced to a first doping agent precursor and the first doping agent precursor and first layer of carbon based semiconductor are irradiated with light having a wavelength in the ultraviolet spectrum thereby selectively doping areas of the first layer of carbon based semiconductor.

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