Method for the production of optical waveguides employing trench

Details Method for the production of optical waveguides employing trench Method for the production of optical waveguides employing trench

1992-05-22

1994-01-25

Dees, Carl F.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 156663, H01L 21306, B44C 122

Patent

active

052813053

ABSTRACT:
A method is described for producing stacked optical waveguides in a silicon dioxide substrate and includes the steps of: etching a first trench in the substrate; filling the first trench with a glassy optical transmission media; depositing a layer of silicon dioxide over the filled trench; etching a second trench in the silicon dioxide layer, the second trench aligned with the first trench; and filling the second trench with a glassy optical transmission media.

REFERENCES:
patent: 3865646 (1975-02-01), Logan et al.
patent: 4070516 (1978-01-01), Kaiser
patent: 4702795 (1987-10-01), Douglas
patent: 4715672 (1987-12-01), Duguay et al.
patent: 4929302 (1990-05-01), Valette
patent: 4931077 (1990-06-01), Angenent et al.
patent: 4933262 (1990-06-01), Beguin
patent: 4973119 (1990-11-01), Taki
patent: 5013129 (1991-05-01), Harada et al.
patent: 5018809 (1991-05-01), Shin et al.
patent: 5026135 (1991-06-01), Booth
patent: 5030316 (1991-07-01), Motoyama et al.
patent: 5118384 (1992-06-01), Harmon et al.

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