Method for the producing an integrated circuit bar...

Details Method for the producing an integrated circuit bar... Method for the producing an integrated circuit bar...

2007-10-23

2007-10-23

Malsawma, Lex (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C257SE21579

Reexamination Certificate

active

11181574

ABSTRACT:
A method for production of an integrated circuit arrangement which contains a capacitor. A dielectric layer is structured with the aid of a two-stage etching process, and with the aid of a hard mask. In the case of an electrically insulating hard mask, the hard mask is removed again. In the case of an electrically conductive hard mask, parts of the hard mask may remain in the circuit arrangement.

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Office Action from the German Patent Office dated Oct. 2, 2003 with non-certified English translation.

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