Method for the preparation of epitaxial ferromagnetic manganese

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156610, 156611, 156613, 156614, 156DIG61, 156DIG73, 156DIG103, C30B 3000

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051694859

ABSTRACT:
A non-volatile memory element based upon a thin epitaxial film of manganese aluminum upon a III-V semiconductor is described. The film is stable at elevated temperatures required for III-V semiconductor device processing, so permitting the monolithic integration of non-volatile memory elements with III-V semiconductor electronic and photonic devices.

REFERENCES:
patent: 3146137 (1964-08-01), Williams
patent: 3399072 (1968-08-01), Pulliam
patent: 3839084 (1974-10-01), Cho et al.
patent: 4829022 (1989-05-01), Kobayashi et al.
"Synthesis of Ferromagnetic & Phase of Mn-Al films by sputtering;" Marisako et al.; Journal Applied Physics vol. 61(8); Apr. 15, 1987.
"Epitaxial Ferromagnetic & MnAl films on GaAs;" Sands et al.; Applied Physics Letters; vol. 57(24), Dec. 10, 1990.

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