Method for the preparation of a pattern overlay accuracy-measuri

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430316, 430317, 430 22, 438975, 438703, G03C 500, G03F 736

Patent

active

056353367

ABSTRACT:
Method for the preparation of pattern overlay accuracy-measuring mark consisting of an inner box and an outer box. The method is characterized in that a groove is formed along the inside boundary line of the outer box, so as to enlarge step thereat. The enlarged step prevents inaccuracy in defining the boundary line, of the outer box whose inaccuracy is mainly attributed to smooth flow which occurs at the boundary line as a metal layer is coated over the outer box. Accordingly, the method can easily define the boundary line and thus, definitely measure the overlay accuracy.

REFERENCES:
patent: 4992394 (1991-02-01), Kostelak, Jr. et al.
patent: 5128280 (1992-07-01), Matsumoto et al.

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