Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1997-01-28
1998-12-15
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430331, G03C 500
Patent
active
058494677
ABSTRACT:
The invention proposes an improved method for the pre-treatment of a photoresist layer formed on a substrate surface prior to pattern-wise exposure of the photoresist layer to actinic rays, in which extraneous portions of the resist layer formed by overspreading of the photoresist solution as in the marginal zone of the patterning area and on the peripheral and back surfaces of the substrate, by dissolving away with a cleaning solution. In contrast to the conventional cleaning solutions consisting entirely or mainly of an organic solvent capable of dissolving the photoresist composition, the cleaning solution used in the inventive method is an aqueous alkaline solution containing a water-soluble alkaline compound dissolved in an aqueous medium consisting of water and a limited amount of a water-miscible organic solvent such as monohydric alcohols, alkyleneglycol monoalkyl ethers and aprotic solvents. The cleaning solution may optionally contain an anti-corrosion agent.
REFERENCES:
patent: 4592787 (1986-06-01), Johnson
patent: 4886728 (1989-12-01), Salamy et al.
patent: 5334332 (1994-08-01), Lee
Harada Kouji
Nagasawa Koichi
Nagatsuka Naomi
Sato Mitsuru
Shimai Hutoshi
Ashton Rosemary
Baxter Janet C.
Tokyo Ohka Kogyo Co. Ltd.
LandOfFree
Method for the pre-treatment of a photoresist layer on a substra does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for the pre-treatment of a photoresist layer on a substra, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the pre-treatment of a photoresist layer on a substra will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1456349