Method for the photolithographic production of structures on a s

Details Method for the photolithographic production of structures on a s Method for the photolithographic production of structures on a s

1991-10-21

1994-04-12

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430322, 430325, 430394, G03F 726

Patent

active

053024958

ABSTRACT:
The present invention relates to a method for the photolithographic production of structures on a support, in particular, the production of structures of the ink feed channels for ink jet heads of ink jet printers, in which the support is provided with a dry-film resist. The object of the invention is to obtain a high steepness of the flank of the structures. This object is achieved in the manner that the support, together with the dry-film resist, is subjected to a brief exposure corresponding to the intended structuring, followed by a rapid heating of the support.

REFERENCES:
patent: 4609427 (1986-09-01), Inamoto
patent: 4649100 (1987-05-01), Leyrer
patent: 4666823 (1987-05-01), Yokota
patent: 4883730 (1989-11-01), Ahne
patent: 4885232 (1989-12-01), Spak

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