Method for the manufacture of quantum structures, in particular

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438483, 438702, H01L 21335, H01L 21778

Patent

active

059899476

ABSTRACT:
A method of manufacturing quantum structures, in particular quantum dots and tunnel barriers and also a component with such quantum structures wherein in that a substrate is structured by the intentional formation of trenches so that material remains between oppositely disposed trench sections, with a transition from a broader region to a narrower region; wherein further material is deposited onto the substrate so that differential growth sets in on the remaining regions of the substrate and an inclined surface arises in the transition region between the broader region and the narrower region and a material height increase arises in the narrower region relative to the broader region; and wherein a different material, or a material of different conductivity, is subsequently deposited, whereby a tunnel barrier arises on the inclined surface and/or a quantum dot arises at the upper end of the inclined surface.

REFERENCES:
patent: 5313684 (1994-05-01), Arimoto
patent: 5436191 (1995-07-01), Paell et al.
patent: 5607876 (1997-03-01), Biengelsew et al.
patent: 5656821 (1997-08-01), Sakuma
patent: 5701017 (1997-12-01), Patel et al.
patent: 5739056 (1998-04-01), Tiwari et al.
patent: 5770475 (1998-06-01), Kim et al.
patent: 5827754 (1998-10-01), Min et al.
patent: 5828076 (1998-10-01), Gossner et al.
Weisbuch, Claude, Quantum Semiconductor Structures. Acad. Press, Inc., 1991, pp. 189-215.
Nakamura, Y., et al., "Modulation of one-dimensional electron density m n-A1GaAs/GaAs edge quantum wire transistor", Appl. Phys. Lett 64(19), May 9, 1994, pp. 2552-2554.
Fukui, T., et al., "GaAs tetrahedral quantum dot structures fabricated using selective area metalorganic chemical vapor deposition", Appl. Phys. Lett 58(18) May 6, 1991, pp. 2018-2020.
Tan, I-Hsing et al., "Systematic observation of strain-induced lateral quantum confinement in GaAs quantum well wires prepared by chemical dry etching", Appl. Phys. Lett. 59(15), Oct. 7, 1991, pp. 1875-1877.
Yuh, Perg-fei, et al., "One-dimensional transport in quantum well wire-high electron mobility transistor", Appl. Phys. Lett 49(25), Dec. 22, 1986, pp. 1738-1740.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for the manufacture of quantum structures, in particular does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the manufacture of quantum structures, in particular , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the manufacture of quantum structures, in particular will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1221062

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.