Method for the manufacture of extremely fine structures

Details Method for the manufacture of extremely fine structures Method for the manufacture of extremely fine structures

1983-07-18

1985-07-16

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430315, 430317, 430316, 430318, 430324, 427 63, 427 99, 1566591, G03C 500

Patent

active

045296863

ABSTRACT:
Method for the manufacture of extremely fine structures and masks with extremely fine structures on substrates, which includes depositing at least one structured mask and at least one material deposit on a substrate, while depositing the material deposit on the structured mask at a given angle.

REFERENCES:
patent: 3387360 (1968-06-01), Nakamura et al.
patent: 3567508 (1971-03-01), Cox et al.
patent: 4218532 (1980-08-01), Dunkleberger
Jelks et al., Appl. Phys. Lett., 34 (1), Jan. 1, 1979, pp. 28-30.
Jelks et al., Appl. Phys. Lett., 38 (11), Jun. 1, 1981, pp. 933-935.

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