Method for the manufacture of an active matrix,...

Details Method for the manufacture of an active matrix,... Method for the manufacture of an active matrix,...

2007-03-13

2007-03-13

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S321000, C430S394000

Reexamination Certificate

active

10634792

ABSTRACT:
In a method for the manufacture of an active matrix for an electro-optical display device, the active zone exposure fields CH1, CH2are obtained by the transfer of an active zone mask in such a way that there is a non-null overlap zone zl, zr, zt, zb between two successive exposure fields. The active zone mask is exposed a first time. This mask is positioned for the next exposure so as to overlap the first exposed field on a certain width F1, F2. In the overlap zones, an exposure of the mask provides only a part of the patterns.

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patent: 6503671 (2003-01-01), Nakajima
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patent: 2000-100692 (2000-04-01), None
patent: 2001-110700 (2001-04-01), None

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