Method for the local removal of UV-transparent insulation layers

Details Method for the local removal of UV-transparent insulation layers Method for the local removal of UV-transparent insulation layers

1992-03-17

1994-08-16

Maples, John S.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156663, 437173, 437187, 437238, H01L 21441, H01L 21306, H01L 21268

Patent

active

053383931

ABSTRACT:
UV-transparent insulating layers, particularly silicon oxide, over conductive structures on a semiconductor substrate, for example an aluminum interconnect, are locally removed in order to expose interconnects for measuring and testing purposes, for repair, or for other uses. For this purpose, the semiconductor substrate is introduced into a vacuum chamber into which a gaseous, layer-forming compound, particularly a metal carbonyl, is admitted with a carrier gas, and the light of a pulsed UV laser is directed onto the location to be uncovered. No highly toxic or corrosive halogen compounds are required. After the removal of the insulating layer, a metal layer can be locally deposited immediately subsequently thereto on the exposed interconnect from the gaseous metal carbonyl with the same process. A good contact for measuring tips, for example, thus being enabled in a simple way.

REFERENCES:
patent: 4668337 (1987-05-01), Sekine
patent: 4693779 (1987-09-01), Okuhira et al.
patent: 4868068 (1989-09-01), Yamaguchi et al.
patent: 4885047 (1989-12-01), Urm et al.
SPIE vol. 459 Laser Assisted Deposition, Etching and Doping, (1984), "UV Laser-Induced Radical-Etching for Microelectronic Processing", by G. L. Loper et al, pp. 121-127.
Solid State Technology, Jun., 1985, "Laser-Induced Chemical Vapor Deposition", by Raj Solanki et al, pp. 220-227.

Affiliated with

Also associated with

Rating

Method for the local removal of UV-transparent insulation layers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the local removal of UV-transparent insulation layers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the local removal of UV-transparent insulation layers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-949033