Method for the formation of resist pattern

Details Method for the formation of resist pattern Method for the formation of resist pattern

1998-08-21

2000-06-06

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430322, 430950, 525154, G03F 700

Patent

active

060716738

ABSTRACT:
The present invention provides a method for the formation of a pattern, which comprises applying an antireflective coating film-forming composition solution comprising (A) a compound which undergoes crosslinking reaction when irradiated with actinic rays and (B) a dye to a substrate to form a coating film thereon, entirely irradiating the coating film with actinic rays to form an antireflective coating film, applying a resist solution to the antireflective coating film, drying the coated material to form a resist layer, and then subjecting the coated material to lithographic treatment to form a resist pattern on the antireflective coating film. The method enables the formation of a resist pattern having an excellent dimensional accuracy and section shape without causing the formation of an intermixed layer between the resist composition and antireflective coating film.

REFERENCES:
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5733714 (1998-03-01), McCulloch et al.
patent: 5851738 (1998-12-01), Thackeray et al.
patent: 5886102 (1999-03-01), Sinta et al.

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