Method for the formation of a diffraction grating

Details Method for the formation of a diffraction grating Method for the formation of a diffraction grating

1987-06-24

1989-02-21

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430 1, 430323, 430329, 350 36, 35016211, G03C 500

Patent

active

048064548

ABSTRACT:
A method for the formation of a diffraction grating on a substrate using a holographic technique and an etching technique, wherein the periodicity of the pattern of the diffraction grating can be changed at will by a change of the light-path length of one of the two light fluxes from a holographic exposing system.

REFERENCES:
patent: 3916182 (1975-10-01), Dabby et al.
patent: 4120559 (1978-10-01), Abramson et al.
patent: 4402571 (1983-09-01), Cowan et al.
Mashev et al., "Formation of Holographic Diffraction Gratings in Photoresist", Applied Physics, A 26, (3), Nov. 1981, pp. 143-149.
Utaka et al., Electronics Letters, 20:24, (1984), pp. 1008-1010.
Suzuki and Tada, SPIE, vol. 239, (1980), pp. 10-18.
Koentjoro et al., Japanese Journal of Applied Physics, 23:10, (1984), pp. L791 and L794.

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