Method for the fabrication of an implantable electrode

Details Method for the fabrication of an implantable electrode Method for the fabrication of an implantable electrode

1984-12-13

1986-09-16

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

128419P, 128784, C23C 1434

Patent

active

046121005

ABSTRACT:
In a method for manufacturing an implantable electrode, particularly a stimulating electrode, vitreous carbon is sputtered from a vitreous carbon target on at least a part of the surface of the electrode. The sputtering is performed in an argon atmosphere at a pressure of 4 to 8.times.10.sup.-2 mbar and at a voltage of 1.6 to 2.4 kV. The electrode may consist essentially of platinum-iridium, vitreous carbon or platinum.

REFERENCES:
patent: 4011861 (1977-03-01), Enger
patent: 4033357 (1977-07-01), Helland et al.
patent: 4542752 (1985-09-01), De Haan et al.
Zivka Marinkovic and Rustum Roy, Preparation and Properties of Sputtered "Glassy" Carbon Films, Jun. 1976, pp. 329-331, vol. 14.

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