Method for the deposition of high-quality crystal epitaxial film

Details Method for the deposition of high-quality crystal epitaxial film Method for the deposition of high-quality crystal epitaxial film

1983-09-16

1985-04-02

Lacey, David L.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156611, 156612, 156DIG74, 156DIG113, 422247, 118729, C30B 2302

Patent

active

045085900

ABSTRACT:
A method for forming a single crystal epitaxial film of a selected metal on the surface of a substrate. The method includes the steps of positioning the substrate in an ultra high vacuum environment and exposing the substrate surface to a metalorganic vapor including ions of the selected metal while maintaining an ultra high vacuum environment.

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patent: 4330360 (1982-05-01), Kubiak et al.
patent: 4434025 (1984-02-01), Robillard

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