Method for testing a photomask

Optics: measuring and testing – By configuration comparison – With object being compared and light beam moved relative to...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

382 61, G01B 1100

Patent

active

047657448

ABSTRACT:
A photomask comprises a tested pattern (P.sub.1, P.sub.2) and a synchronization pattern (SP.sub.1 .about.SP.sub.8). The synchronization pattern is used for synchronizing a scanning signal (S.sub.9), obtained from the tested pattern, with a reference signal (S.sub.10), based on a reference pattern data stored on a magnetic tape (7).

REFERENCES:
patent: 3847346 (1974-11-01), Dolch
patent: 3852573 (1974-12-01), Dolch
patent: 4065212 (1977-12-01), Belleson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for testing a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for testing a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for testing a photomask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-833633

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.