Optics: measuring and testing – By configuration comparison – With object being compared and light beam moved relative to...
Patent
1987-03-05
1988-08-23
Rosenberger, R. A.
Optics: measuring and testing
By configuration comparison
With object being compared and light beam moved relative to...
382 61, G01B 1100
Patent
active
047657448
ABSTRACT:
A photomask comprises a tested pattern (P.sub.1, P.sub.2) and a synchronization pattern (SP.sub.1 .about.SP.sub.8). The synchronization pattern is used for synchronizing a scanning signal (S.sub.9), obtained from the tested pattern, with a reference signal (S.sub.10), based on a reference pattern data stored on a magnetic tape (7).
REFERENCES:
patent: 3847346 (1974-11-01), Dolch
patent: 3852573 (1974-12-01), Dolch
patent: 4065212 (1977-12-01), Belleson et al.
Fujitsu Limited
Rosenberger R. A.
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